Vacuum Oven – YES

YES Vacuum Convection Oven can be used to cure polyimide films on only Silicon and quarts/glass substrates in an O2 and H2O free environment. Any other substrate or materials must be approved by the staff before use.

Temperature range 20°C – 300°C
Temperature Controller Single set point PID
Atmosphere vacuum
Maximum Substrate size 400 mm
Resolution ±0.5 °C
Max vacuum 40 mTorr

Training Manual: Vacuum Oven – YES