Atomic Layer Deposition – Arradiance GEMStar XT-P


The Arradiance ALD XT-P is full-featured ALD system capable of depositing highly conformal films over flat and patterned substrates and powders. Both metals and dielectrics can be deposited and multi-layer materials can be produced as well.

Features and Specifications

  • 300 Watt plasma head for remote Plasma-Enhanced ALD (PEALD)
  • Substrate heating to 500oC for thermal ALD
  • Pulsed Vapor Push for low vapor pressure precursors
  • Rotating cartridges for uniform coating of micro/nano particles
  • Platen suitable for up to 8” substrates
  • O2, N2, NH3, H2 and Ar gases for both thermal and plasma ALD
  • Integrated gas safety interlock to prevent dangerous reactions

Training Document: ALD