YES Vacuum Convection Oven can be used to cure polyimide films on only Silicon and quarts/glass substrates in an O2 and H2O free environment. Any other substrate or materials must be approved by the staff before use.
|Temperature range||20°C – 300°C|
|Temperature Controller||Single set point PID|
|Maximum Substrate size||400 mm|
|Max vacuum||40 mTorr|
Training Manual: Vacuum Oven – YES