Reactive Ion Etcher (RIE) – Samco RIE-10NR

  • Wafer size: up to 200 mm
  • Turbo pump backed by a dry roughing pump
  • RF Power: 13.56 MHz, 300 W
  • Six gas lines: CF4, CHF3, SF6, O2 (20 sccm), O2 (200 sccm), Ar/N2

Reactive Ion Etcher (REI)

Training Manual: Reactive_Ion_Etcher(RIE)_SamcoRIE-10NR_0