Plasma Enhanced Chemical Vapor Deposition (PECVD) – STS LpX CVD

  • Wafer size: 100 mm
  • Configured for SiO2, Si3N4, and a-Si deposition
  • Vacuum Loadlock
  • Gases: N2, Ar, He, N2O, 2%SiH4/N2, NH3, C4F8
PECVD
Training Manual: PECVD_STS_LpX_CVD_10212015